2.830J Control of Manufacturing Processes (SMA 6303) (MIT)
2.830J Control of Manufacturing Processes (SMA 6303) (MIT) course explores statistical modeling and control in manufacturing processes. Topics include the use of experimental design and response surface modeling to understand manufacturing process physics, as well as defect and parametric yield modeling and optimization. Various forms of process control, including statistical process control, run by run and adaptive control, and real-time feedback control, are covered. Application contexts include semiconductor manufacturing, conventional metal and polymer processing, and emerging micro-nano manufacturing processes.
- Source: Massachusetts Institute of Technology
- Language: English
- Author: Hardt, David
- Lisence Terms: Content within individual OCW courses is (c) by the individual authors unless otherwise noted. MIT OpenCourseWare materials are licensed by the Massachusetts Institute of Technology under a Creative Commons License (Attribution-NonCommercial-ShareAlike). For further information see http://ocw.mit.edu/terms/index.htm
- Tags: Process control, manufacturing process, discrete system feedback control theory, empirical and adaptive modeling, off-line optimization, statistical process control, real-time control., real-time control, 2.830J, 2.830, one-factor-at-a-time, robustness, Shewhart Hypothesis, semiconductor manufacturing,
- Course Publishing Date: Jan 27, 2009
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